Реакция #418006

ord-cd3eb982504f451c9cdb4e6638c8c71d

Уравнение реакции

CCOC(C)=O
EtOAc
C#C[Si](C)(C)C
trimethylsilylacetylene
CCNC(=O)C(C)c1ccc(I)cc1
N-ethyl-2-(4-iodo-phenyl)-propionamide
CCNC(=O)C(C)c1ccc(C#C[Si](C)(C)C)cc1
desired product
CCNC(=O)C(C)c1ccc(C#C[Si](C)(C)C)cc1
N-Ethyl-2-(4-trimethylsilanylethynyl-phenyl)-propionamide

Растворители

Условия реакции

Подробные условия
See reaction.notes.procedure_details.

Обработка

  1. 1
    Промывкаthe organic layer is washed with saturated ammonium chloride solution and brine
  2. 2
    ДругоеThe organic layer is separated
  3. 3
    Сушкаdried over sodium sulphate
  4. 4
    Другоеthe solvent is evaporated
  5. 5
    ДругоеThe residue is purified by column chromatography (silicia gel; EtOAc/heptane, gradient 50% to 80%)

Методика

To 4.90 g (49.9 mmol) trimethylsilylacetylene in 450 mL acetonitrile are added 12.1 g (39.9 mmol) N-ethyl-2-(4-iodo-phenyl)-propionamide (IV.1) under argon, followed by 1.68 g (2.40 mmol) Pd(PPh3)2Cl2 as catalyst, 0.23 g (1.20 mmol) copper(I)iodide and 11.1 mL (80 mmol) TEA as base. The mixture is stirred at rt for 2.5 h. After that time, EtOAc is added and the organic layer is washed with saturated ammonium chloride solution and brine. The organic layer is separated, dried over sodium sulphate and the solvent is evaporated. The residue is purified by column chromatography (silicia gel; EtOAc/heptane, gradient 50% to 80%) to yield the desired product.

Источник

DOI: 10.6084/m9.figshare.5104873.v1Патент: US08877754B2uspto-grants-2014_11