반응 #76821

ord-83f8d50e146b4a3ebdf0a609467648ec

반응 방정식

FC(F)(F)C(F)(OC(F)(F)C(F)(F)I)C(F)(F)F
(CF3)2CFOCF2CF2I
FC(F)C(F)(F)OC(F)(C(F)(F)F)C(F)(F)F
(CF3)2CFOCF2CHF2
수율 80.0%

시약

반응 조건

온도
55°CELSIUS
상세 조건
See reaction.notes.procedure_details.

후처리

  1. 1
    기타After the exothermic reaction
  2. 2
    workup.DISTILLATIONThe reaction mixture was then distilled
  3. 3
    기타of less then 80° C. was collected
  4. 4
    세척This fraction was washed with an aqueous HCl solution
  5. 5
    workup.DISTILLATIONdistilled over conc. H2SO4

실험 절차

A solution of (CF3)2CFOCF2CF2I (21.3 g) in isopropanol (8 mL) was added dropwise to a suspension of Al chips (1 g) and HgCl2 (0.4 g) in isopropanol (30 mL). After the exothermic reaction was completed, the reaction mixture was stirred for 1 hour at 55° C. The reaction mixture was then distilled and a fraction with a b.p. of less then 80° C. was collected. This fraction was washed with an aqueous HCl solution and then distilled over conc. H2SO4 to give (CF3)2CFOCF2CHF2 (11.8 g, 80% yield), b.p. 44 to 46° C. The 1H and 19F NMR were in accord with the assigned structure:

출처

DOI: 10.6084/m9.figshare.5104873.v1특허: US06703533B1uspto-grants-2004_03