반응 #495234
ord-9b8f4d7ad4174ee1b78975c22da0caae
반응 조건
후처리
- 1기타bubbled with nitrogen or argon gas for at least 30 min
- 2기타to react with VFc or FcA for about 12 h
- 3기타During the reaction
- 4기타the solution was also purged with nitrogen (or argon)
- 5workup.DISSOLUTIONto eliminate dissolved oxygen
- 6기타After the reaction
- 7세척was rinsed with dichloromethane, acetonitrile, and methanol
- 8기타and dried under a stream of nitrogen gas
실험 절차
Approximately 10 mmol mesitylene solution of vinylferrocene (VFc) or ferrocenecarboxaldehyde (FcA) was put in a round bottom flask and bubbled with nitrogen or argon gas for at least 30 min. A piece of the H-terminated silicon substrate was then immersed in the solution and allowed to react with VFc or FcA for about 12 h under reflux at about 150° C. in an oil bath. During the reaction, the solution was also purged with nitrogen (or argon) to eliminate dissolved oxygen and to prevent the substrate from being oxidized. After the reaction, the substrate derivatized with VFc or FcA was rinsed with dichloromethane, acetonitrile, and methanol; and dried under a stream of nitrogen gas. The derivatization of the H-terminated surface with ferrocene moieties as described in Example 2 is illustrated in FIG. 5.