반응 #428904

ord-f0a2053055f94cdca01b38a00b7e9686

반응 조건

상세 조건
See reaction.notes.procedure_details.

후처리

  1. 1
    workup.WAITNext, the mixture was left
  2. 2
    여과The resulting precipitate was filtered
  3. 3
    기타dried
  4. 4
    기타to obtain a base polymer as a resist material

실험 절차

Trimethylsilylmethyl methacrylate (TMSMMA) and dimethylbenzyl methacrylate (DBMA) were mixed in a ratio of 1:1 so as to prepare a toluene solution having a monomer concentration of 5.0 mol/liter. Next, 2 mol %, on the basis of the monomer of the toluene solution, of 2,2'-azobis(isobutylonitrile) (AIBN) was added to the solution, and the mixture was retained in an oil bath at 80° C. for 8 hours with stirring. Next, the mixture was left standing to cool at room temperature, was diluted with toluene and was thereafter dropped into large quantities of a methanol solution. The resulting precipitate was filtered and dried to obtain a base polymer as a resist material. There was thus obtained a trimethylsilylmethyl methacrylate/dimethylbenzyl methacrylate copolymer represented by the following formula, ##STR11## wherein each of m and n is a positive integer. In this example, the copolymer described above could be obtained at a yield of 60%, the molecular weight was 27,000 and the dispersion was 1.61.

출처

DOI: 10.6084/m9.figshare.5104873.v1특허: US05856071uspto-grants-1999_01