反応 #49551
ord-153c8715831046a0960329654ff08d74
反応方程式
反応条件
後処理
- 1その他The solvent was evaporated under reduced pressure
- 2workup.DISSOLUTIONThe residue was dissolved in methanol (50 mL)
- 3workup.ADDITIONthe solution was treated with 2 mol/L aqueous potassium hydroxide solution (50 mL)
- 4その他The solvent was evaporated under reduced pressure
- 5workup.ADDITIONThe residue was added with 4 mol/L hydrochloric acid
- 6抽出extracted with ethyl acetate
- 7洗浄The organic layer was washed with saturated brine
- 8乾燥dried over anhydrous sodium sulfate
- 9その他The solvent was evaporated under reduced pressure
実験手順
In a similar manner to Step 1 of Example 347, 3-hydroxy-4-methylbenzoic acid (2.00 g, 13.1 mmol) was suspended in dichloromethane (50 mL), and the suspension was treated with diisopropylethylamine (13.7 mL, 78.6 mmol) and chloromethyl methyl ether (5.00 mL, 65.8 mmol). The solvent was evaporated under reduced pressure. The residue was dissolved in methanol (50 mL), and the solution was treated with 2 mol/L aqueous potassium hydroxide solution (50 mL). The solvent was evaporated under reduced pressure. The residue was added with 4 mol/L hydrochloric acid and extracted with ethyl acetate. The organic layer was washed with saturated brine and dried over anhydrous sodium sulfate. The solvent was evaporated under reduced pressure to obtain 3-methoxymethoxy-4-methylbenzoic acid (2.69 g).