反応 #44313

ord-940987a91602489c8ac2c7785e3142dd

反応方程式

C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1
hexamethylcyclotrisiloxane
C=C(C)C(=O)O[Si](C)(C)C
trimethylsilyl methacrylate
COc1ccc(O)cc1
4-methoxy phenol
CCN(CC)CC
triethylamine
C=C(C)C(=O)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C
nonamethyl-1-methacryloyloxy-tetrasiloxane

溶媒

反応条件

詳細条件
See reaction.notes.procedure_details.

後処理

  1. 1
    ろ過the salts were filtered
  2. 2
    その他After evaporation of the solvent, distillation under reduced pressure (0.3 mbar, 80° C.)

実験手順

50 g of hexamethylcyclotrisiloxane, 35.6 g of trimethylsilyl methacrylate, 2.5 g of zinc chloride and 0.4 g of 4-methoxy phenol were dissolved in 50 ml of toluene. After 11 h at 100° C., the mixture was allowed to cool until room temperature, 40 ml of triethylamine were then added and the salts were filtered. After evaporation of the solvent, distillation under reduced pressure (0.3 mbar, 80° C.) furnished pure nonamethyl-1-methacryloyloxy-tetrasiloxane.

出典

DOI: 10.6084/m9.figshare.5104873.v1特許: US07736634B2uspto-grants-2010_06