反応 #2195496
ord-75be9fd997ff46318c22bedcbac45d50
反応方程式
反応物
試薬
反応条件
後処理
- 1温度cool in an ice/water bath under argon
- 2workup.STIRRINGRemove ice bath and stir for 2 h at room temperature
- 3温度heat
- 4温度under reflux for 3 h
- 5温度Cool in an ice/water bath
- 6その他Partition the reaction mixture between 30 mL each of ether and water
- 7洗浄wash the organic layer with 1N HCl, saturated sodium bicarbonate, and brine
- 8乾燥dry over MgSO4
- 9濃縮concentrate in vacuo
- 10workup.DISSOLUTIONDissolve the residue in 2 mL of DMF
- 11洗浄washed with hexane twice
- 12その他to remove mineral oil) and 4 mL of DMF under argon
- 13workup.STIRRINGStir for 16 h at room temperature
- 14その他Cautiously decompose excess sodium hydride with several drops of water and partition the mixture between ethyl acetate and water
- 15抽出Extract the aqueous layer twice with more ethyl acetate
- 16洗浄wash the combined organic layers with 1N HCl, saturated sodium bicarbonate, and brine
- 17乾燥Dry over MgSO4
- 18濃縮concentrate in vacuo
- 19その他Purify the residue by silica gel chromatography
実験手順
Dissolve 3.4 mmol of benzylamine in 12 mL of methylene chloride and cool in an ice/water bath under argon. Add 4.1 mmol of trimethylaluminum as a 2 M hexane solution dropwise during several minutes. Stir for 10 min, then add 3.4 mmol of the product of Example 7 as a solution in 4 mL of methylene chloride. Remove ice bath and stir for 2 h at room temperature, then heat under reflux for 3 h. Cool in an ice/water bath and cautiously decompose excess trimethylaluminum with water. Partition the reaction mixture between 30 mL each of ether and water and wash the organic layer with 1N HCl, saturated sodium bicarbonate, and brine, then dry over MgSO4 and concentrate in vacuo. Dissolve the residue in 2 mL of DMF and add to a slurry of 3.5 mmol of sodium hydride (washed with hexane twice to remove mineral oil) and 4 mL of DMF under argon. Stir for 16 h at room temperature. Cautiously decompose excess sodium hydride with several drops of water and partition the mixture between ethyl acetate and water. Extract the aqueous layer twice with more ethyl acetate, then wash the combined organic layers with 1N HCl, saturated sodium bicarbonate, and brine. Dry over MgSO4 and concentrate in vacuo. Purify the residue by silica gel chromatography using ethyl acetate/hexanes eluant to yield the title compound.