Reacción #52142

ord-d0ee01d0729c4903be151f6d627b25e5

Condiciones de reacción

Condiciones detalladas
See reaction.notes.procedure_details.

Tratamiento posterior

  1. 1
    Otrodegassed THF (800 ml)
  2. 2
    workup.ADDITIONA solution of degassed saturated K2CO3 (400 ml) was added afterwards
  3. 3
    OtroThe whole mixture was degassed with nitrogen for an additional 10 min
  4. 4
    Temperaturaat reflux under nitrogen for 24 hrs
  5. 5
    ConcentraciónThe reaction mixture was concentrated under reduced pressure
  6. 6
    Otroto remove THF and 400 ml of CH2Cl2
  7. 7
    workup.ADDITIONwas then added
  8. 8
    LavadoThe CH2Cl2 layer was washed with water (200 ml) and brine (200 ml)
  9. 9
    Secadodried over Na2SO4
  10. 10
    Otroevaporated
  11. 11
    OtroThe solid residue was recrystallized from EtOAc (100 ml)

Procedimiento

To a 2 liter Schlenk flask was added (2-iodo-3,4,5-trimethoxyphenyl) diphenylphosphine oxide 21 (30 g, 61 mmol), phenylboronic acid (11.1 g, 91 mmol), and degassed THF (800 ml). A solution of degassed saturated K2CO3 (400 ml) was added afterwards. The whole mixture was degassed with nitrogen for an additional 10 min. Then, Pd(PPh3)4 (1.22 mmol, 1.4 g) was added in the solution through one portion. The mixture was stirred at reflux under nitrogen for 24 hrs. In situ 31PNMR showed that the reaction was complete. The reaction mixture was concentrated under reduced pressure to remove THF and 400 ml of CH2Cl2 was then added. The CH2Cl2 layer was washed with water (200 ml) and brine (200 ml), dried over Na2SO4, and evaporated. The solid residue was recrystallized from EtOAc (100 ml) to give off-white product 22 (23 g). The mother liquid was passed though a silica gel column to give another 4 g of product 22. The total yield was 98%.

Fuente

DOI: 10.6084/m9.figshare.5104873.v1Patente: US06855657B2uspto-grants-2005_02