Reaktion #90194
ord-1ec2ae6e749142edbf1f236643bd9e0d
Reaktionsgleichung
Edukte
Reagenzien
Lösungsmittel
Reaktionsbedingungen
Aufarbeitung
- 1TemperaturAfter cooling
- 2Filtrationthe reaction solution was filtered
- 3Einengenconcentrated under reduced pressure
- 4SonstigeThe resulting residues were purified by silica gel column (ethyl acetate/hexane)
- 5workup.DISSOLUTIONThe resulting residues were dissolved in THF (0.4 ml)
- 6Sonstigeirradiation at 80° C. for 15 min under nitrogen atmosphere
- 7WaschenThe organic layer was washed with saturated aqueous solution of sodium hydrocarbonate and saturated brine
- 8Einengenconcentrated under reduced pressure
- 9SonstigeThe resulting residues were purified by thin layer chromatography (MeOH/DCM)
- 10Sonstigeto obtain Compound GT20-2 (10.5 mg) and Compound GT20-3 (2.4 mg)
Vorschrift
8-Hydroxy-6,6-dimethyl-3-(2-phenyl-ethanesulfonyl)-5,6-dihydro-benzo[b]carbazol-11-one (30 mg, 0.0673 mmol), [(4R,5R)-5-(tert-butyl-dimethyl-silanyloxymethyl)-2,2-dimethyl-[1,3]dioxolan-4-yl]methanol (22.3 mg, 0.0808 mmol), and PPh3 (23 mg, 0.0875 mmol) were dissolved in THF (0.5 ml), added with DIAD (0.0169 ml, 0.0808 mmol), and the mixture was stirred at 50° C. overnight. After cooling, the reaction solution was filtered and concentrated under reduced pressure. The resulting residues were purified by silica gel column (ethyl acetate/hexane). The resulting residues were dissolved in THF (0.4 ml) and water (0.13 ml), added with camphor sulfonic acid (28.1 mg, 0.121 mmol), and then subjected to microwave irradiation at 80° C. for 15 min under nitrogen atmosphere. Ethyl acetate was added to the resultant. The organic layer was washed with saturated aqueous solution of sodium hydrocarbonate and saturated brine, and then concentrated under reduced pressure. The resulting residues were purified by thin layer chromatography (MeOH/DCM) to obtain Compound GT20-2 (10.5 mg) and Compound GT20-3 (2.4 mg).