Reaktion #495234

ord-9b8f4d7ad4174ee1b78975c22da0caae

Reaktionsbedingungen

Temperatur
150°CELSIUS
Detaillierte Bedingungen
See reaction.notes.procedure_details.

Aufarbeitung

  1. 1
    Sonstigebubbled with nitrogen or argon gas for at least 30 min
  2. 2
    Sonstigeto react with VFc or FcA for about 12 h
  3. 3
    SonstigeDuring the reaction
  4. 4
    Sonstigethe solution was also purged with nitrogen (or argon)
  5. 5
    workup.DISSOLUTIONto eliminate dissolved oxygen
  6. 6
    SonstigeAfter the reaction
  7. 7
    Waschenwas rinsed with dichloromethane, acetonitrile, and methanol
  8. 8
    Sonstigeand dried under a stream of nitrogen gas

Vorschrift

Approximately 10 mmol mesitylene solution of vinylferrocene (VFc) or ferrocenecarboxaldehyde (FcA) was put in a round bottom flask and bubbled with nitrogen or argon gas for at least 30 min. A piece of the H-terminated silicon substrate was then immersed in the solution and allowed to react with VFc or FcA for about 12 h under reflux at about 150° C. in an oil bath. During the reaction, the solution was also purged with nitrogen (or argon) to eliminate dissolved oxygen and to prevent the substrate from being oxidized. After the reaction, the substrate derivatized with VFc or FcA was rinsed with dichloromethane, acetonitrile, and methanol; and dried under a stream of nitrogen gas. The derivatization of the H-terminated surface with ferrocene moieties as described in Example 2 is illustrated in FIG. 5.

Quelle

DOI: 10.6084/m9.figshare.5104873.v1Patent: US08758584B2uspto-grants-2014_06