Reaktion #495234
ord-9b8f4d7ad4174ee1b78975c22da0caae
Reaktionsgleichung
Reagenzien
Reaktionsbedingungen
Aufarbeitung
- 1Sonstigebubbled with nitrogen or argon gas for at least 30 min
- 2Sonstigeto react with VFc or FcA for about 12 h
- 3SonstigeDuring the reaction
- 4Sonstigethe solution was also purged with nitrogen (or argon)
- 5workup.DISSOLUTIONto eliminate dissolved oxygen
- 6SonstigeAfter the reaction
- 7Waschenwas rinsed with dichloromethane, acetonitrile, and methanol
- 8Sonstigeand dried under a stream of nitrogen gas
Vorschrift
Approximately 10 mmol mesitylene solution of vinylferrocene (VFc) or ferrocenecarboxaldehyde (FcA) was put in a round bottom flask and bubbled with nitrogen or argon gas for at least 30 min. A piece of the H-terminated silicon substrate was then immersed in the solution and allowed to react with VFc or FcA for about 12 h under reflux at about 150° C. in an oil bath. During the reaction, the solution was also purged with nitrogen (or argon) to eliminate dissolved oxygen and to prevent the substrate from being oxidized. After the reaction, the substrate derivatized with VFc or FcA was rinsed with dichloromethane, acetonitrile, and methanol; and dried under a stream of nitrogen gas. The derivatization of the H-terminated surface with ferrocene moieties as described in Example 2 is illustrated in FIG. 5.